• 专利附录
  • 专利说明
  • 权利要求
  • 类似技术
  • 同族专利
  • 引用文献
  • 法律状态
  • 优先权
    • 专利摘要:
    The present invention improves the peeling efficiency by providing a sponge roller and the spray of the peeling liquid spray in the peeling liquid tank, and by spraying pure water loaded with ultrasonic waves in the washing tank to facilitate the peeling of the fine residue existing on the surface of the iron plate to yield the product And it relates to a photosensitive film removal method of the shadow mask manufacturing equipment to improve the quality, A first step of dipping the iron plate in the stripping solution to swell the photosensitive film to lower adhesion to the iron plate; A second process of spraying pure water loaded with ultrasonic waves on the iron plate on which the first process is performed to peel off the residue present on the iron plate; A third process of removing the photoresist film from the surface of the iron plate by spraying water of high pressure on the iron plate on which the second process is performed; A fourth step of depositing the anti-rust solution on the surface by immersing the iron plate in the anti-rust solution so that the iron plate on which the third process is performed is not rusted in a subsequent process; And a fifth process of spraying a cleaning solution on the iron plate on which the fourth process is performed to remove foreign substances on the surface of the iron plate.
    公开号:KR20000059974A
    申请号:KR1019990007940
    申请日:1999-03-10
    公开日:2000-10-16
    发明作者:이용인
    申请人:구자홍；엘지전자 주식회사；
    IPC主号:
    专利说明:

    Photoresist removal method for shadow mask manufacturing system
    The present invention relates to a method for removing a photoresist film of a shadow mask manufacturing equipment, and more particularly, to a method for removing a photoresist film of a shadow mask manufacturing equipment for removing photoresist residue and other foreign matters after an etching process of an iron plate in manufacturing a shadow mask.
    As the display device mainly used as a display means as shown in Fig. 1, the electron gun 1, the CPM 2, the deflection yoke 3, the inner shield 4, the funnel 5, A panel 6, a fluorescent surface 7, and a shadow mask 8.
    Referring to the operation principle of the display device as described above, the electron beams of R, G, and B emitted from the electron gun 1 are deflected vertically and horizontally in the deflection yoke 3, and the holes of the shadow mask 8 are closed. Pass through and hit the fluorescent surface 7 corresponding to the inner surface of the panel to reproduce the color through a combination of three primary colors. Here, the performance of the display apparatus of the shadow mask 8 that determines the combination of the three primary colors is determined according to the manufacturing quality.
    2 illustrates a form in which a plurality of shadow masks are made on an iron plate which is a material.
    Referring to FIG. 2, in the manufacturing process of the shadow mask, a plurality of horizontal plates are formed on the iron plate, and hundreds of thousands of holes are formed in each shadow mask. At this time, according to the shape of the hole is divided into CPT (color picture tube) and CDT (color display tube).
    The CPT is mainly used for televisions, and about 150,000 holes are formed in slots. In addition, CDT is mainly used for computer monitors, and about 800,000 holes are formed in a circular shape. In this case, in the case of the CDT, the sizes of the holes in the front and rear surfaces are different from each other.
    In the above, each hole has a characteristic that the size and the amount of taper vary depending on the position. At this time, the shape of the hole formed in the shadow mask is symmetrical with respect to the center line, the taper amount of the portion away from the center from the hole is formed larger than the taper amount of the portion close to the center.
    3 is a diagram illustrating a manufacturing process of a shadow mask.
    Referring to FIG. 3, a shadow mask may be manufactured by sequentially performing a front process, an exposure process, a developing process, and an etching process.
    In this case, as shown in FIG. 3A, when the iron plate 11, which is a raw material, is introduced from the outside, the rust-preventing oil and foreign substances on the surface of the iron plate 11 are removed, and a photoresist is provided. : Corrosion of the surface of the iron plate (11) with nitric acid to facilitate the application of PR, and neutralizing and cleaning the nitric acid, and then the photosensitive liquid is applied to the upper and lower surfaces of the iron plate (11) to form the photosensitive films (12, 13).
    In addition, in the exposure process, as shown in FIG. 3B, a specific portion of the photosensitive films 12 and 13 formed on the iron plate 11 is exposed according to a pattern using a mask (not shown). In this case, areas exposed on the upper and lower surfaces of the iron plate 11 are different from each other.
    In the developing step, as illustrated in FIG. 3C, the photosensitive films 12B and 13B that are not exposed in the exposure step are removed using a developing solution. At this time, the iron plate 11 is exposed at the position to make a hole in the shadow mask, and the photosensitive films 12A and 13A of the exposed portion are cured by dichromic acid. Thereafter, washing with water to remove the dichromic acid is performed.
    In the etching process, as shown in FIG. 3D, the first surface of the iron plate 11 is sprayed with an etchant such as ferric chloride through the exposed portions 14 and 15 in the developing process. And through holes are individually corroded to form through holes. At this time, the UV resin is applied to the surface where the etching is not to be performed so that the etching of the other surface does not proceed while the etching of the specific surface is performed. Since the size of the portions exposed on both sides of the iron plate 11 is different from each other, the degree of etching of the upper and lower surfaces of the iron plate 11 is different. Thereafter, the shadow mask is completed by removing the photosensitive films 12A and 13A and the UV resin present on the upper and lower surfaces of the iron plate 11.
    However, in the above process, since the defect rate in the subsequent process is determined according to the removal of the photoresist film and the UV resin during the etching process, the quality of the shadow mask and the yield of the product are determined. Therefore, there is a need for a foreign matter removal device for precisely performing the removal operation.
    4 is a view showing the configuration of a photoresist film removing apparatus of a shadow mask manufacturing apparatus according to the prior art.
    Referring to FIG. 4, reference numeral 21 denotes that after the etching is performed, when the iron plate 11 is flushed with water to remove the etchant and the residue, the photoresist (PR) and the UV resin are swollen to improve adhesion to the iron plate 11. The peeling liquid tank which reduces is shown, 22 is the 1st water which sprays the high pressure water to the iron plate 11 which passed through the said peeling liquid tank 21 so that it may incline, and peels the photosensitive liquid PR and UV resin from the iron plate 11 surface. 23 represents a rust tank, and 23 shows an rust prevention tank in which the iron plate 11 that has passed through the first flush tank 22 is immersed in the rust preventive solution so as to bury the rust preventive solution on the surface to prevent the iron plate 11 from rusting in a subsequent process. 24 denotes a second water washing tank for spraying a cleaning liquid on the iron plate 11 which has passed through the rustproof liquid tank 23 to remove foreign substances on the surface of the iron plate 11.
    In addition, reference numeral 31 denotes a conveying roller which performs the movement of the iron plate 11, 32 denotes a peeling spray which is disposed in the first flush tank 22 and injects water of 50 to 200 kgf / cm 2, and 33 denotes The flushing spray which is arrange | positioned in the 2nd washing tank 24 and injects a washing | cleaning liquid is shown.
    The method of removing the photoresist film of the shadow mask manufacturing equipment according to the prior art as described above does not completely remove the peeling residue and foreign matters, thereby increasing the defect rate, thereby causing a problem of lowering the quality and yield of the product.
    In addition, since the peeling residue is often stuck in the hole of the shadow mask by using the spray method, there is a problem of causing secondary defects in the subsequent process.
    The present invention has been made to solve the above problems, an object of the present invention is to provide a photosensitive film removal method of the shadow mask manufacturing equipment that can improve the peeling efficiency by providing a sponge roller and a peeling liquid spray in the peeling liquid tank.
    In addition, another object of the present invention by using an aqua knife to spray the pure water loaded with ultrasonic waves in the washing tank to facilitate the peeling of the fine residue present on the surface of the iron plate to improve the yield and quality of the product The present invention provides a method for removing a photoresist film of a shadow mask manufacturing equipment.
    In addition, another object of the present invention is a shadow mask manufacturing equipment that can remove the foreign matter and water at the same time generated by the air knife using an air knife (air knife) on the clean-up iron plate at the same time water To provide a method for removing the photosensitive film.
    1 is a view showing the configuration of a general display device;
    2 is a view showing a form in which a plurality of shadow masks are made on an iron plate,
    3 is a view showing a manufacturing process of a shadow mask;
    4 is a view showing the configuration of a photosensitive film removing apparatus according to the prior art;
    5 is a view showing the configuration of a photosensitive film removing apparatus according to the present invention;
    Figure 6 is a view showing the arrangement of the aqua knife according to the present invention.
    <Explanation of symbols for the main parts of the drawings>
    41: stripping liquid tank 42: first water washing tank
    43: second washing tank 44: antirust tank
    45: third washing tank 51: conveying roller
    52: sponge roller 53: peeling liquid spray
    54: sponge roller 55: aqua knife
    56: 1st flush spray 57: 2nd flush spray
    58: air knife 59: ultrasonic oscillator
    According to a feature of the present invention for achieving the above object, the first step of immersing the iron plate in the peeling solution to swell the photosensitive film to lower the adhesion to the iron plate; A second process of spraying pure water loaded with ultrasonic waves on the iron plate on which the first process is performed to peel off the residue present on the iron plate; A third process of removing the photoresist film from the surface of the iron plate by spraying water of high pressure on the iron plate on which the second process is performed; A fourth step of depositing the anti-rust solution on the surface by immersing the iron plate in the anti-rust solution so that the iron plate on which the third process is performed is not rusted in a subsequent process; And a fifth process of spraying a cleaning solution on the iron plate on which the fourth process is performed to remove foreign substances on the surface of the iron plate.
    At this time, according to an additional feature of the present invention, the first process and the second process includes a step of lowering the adhesive force of the photosensitive film and the iron plate by pressing by using a sponge roller on the upper and lower sides of the iron plate, the first process Injecting the peeling solution at a high pressure to peel off the photosensitive film is reduced adhesion, the second process is preferably sprayed pure water carrying ultrasonic waves toward the iron plate to peel off the photosensitive film is reduced adhesion. .
    In addition, the stripping liquid used in the first process is maintained at a temperature of 60 to 90 ℃, the pressure of the stripping liquid and the pure water sprayed in the first and second processes is preferably maintained to 10 to 100kgf / ㎠.
    In addition, the fifth process may include the step of removing the foreign matter on the surface of the iron plate by removing the foreign matter on the surface of the iron plate by spraying the cleaning liquid on the iron plate, and then removing the foreign matter and water present on the surface of the iron plate.
    Hereinafter, with reference to the accompanying drawings, preferred embodiments of the present invention will be described in detail.
    5 is a view showing the configuration of the photoresist film removing apparatus of the shadow mask manufacturing equipment according to the present invention.
    Referring to FIG. 5, reference numeral 41 denotes an adhesion force to the iron plate 11 by swelling the photoresist liquid PR and UV resin when the iron plate 11 is washed with water to remove the etchant and the residue after the etching is performed. 42 shows a 1st water tank which peels the residue which exists in the iron plate 11 by spraying the pure water which carried the ultrasonic wave to the iron plate 11 which passed through the said separation liquid tank 41, and 43 A high pressure water is sprayed on the iron plate 11 passing through the first washing tank 42 so as to be inclined, and a second water washing tank for removing the photoresist film PR and UV resin from the surface of the iron plate 11 is indicated. The steel plate 11 passing through the second washing tank 43 is immersed in the rust preventive solution to bury the rust preventive solution on the surface to represent the rust preventive tank to prevent the iron plate 11 in the subsequent process, 45 is the rust preventive solution tank 44 Cleaning liquid is sprayed on the iron plate 11 which has passed through) to remove foreign substances on the surface of the iron plate 11. The number 3, which shows a Sejo.
    In addition, reference numeral 51 denotes a conveying roller for moving the iron plate 11, 52 is disposed so as to be in contact with the upper and lower sides of the iron plate 11 conveyed from the stripping liquid tank 41, the photosensitive film PR and UV resin Denotes a sponge roller for crimping, and reference numeral 53 denotes a peeling liquid spray which is disposed on the upper portion of the peeling liquid tank 41 and sprays the peeling liquid at a high pressure toward the iron plate 11.
    In addition, reference numeral 54 denotes a sponge roller which is arranged to contact the upper and lower sides of the iron plate 11 conveyed from the first washing tank 42 to compress the photosensitive film PR and the UV resin, and 55 denotes the first water. An aqua knife disposed on the upper side of the tub 42 and spraying pure water loaded with ultrasonic waves toward the iron plate 11, and 56 is disposed in the second washing tub 43 to be 10 to 100 kgf / cm 2. A first flush spray for spraying water is shown, 57 is a second flush spray for dispensing a cleaning liquid disposed in the third flush tank 45, and a 58 is disposed in the third flush tank 45 for air. An air knife which sprays to remove foreign substances and water from the surface of the iron plate 11 is shown.
    In the above, as shown in Figure 6, the aqua knife 55, the ultrasonic oscillator 59 is coupled to the ultrasonic wave to the sprayed pure water.
    Referring to the operation of the present invention as described above are as follows.
    First, when the iron plate 11 proceeds in the state of being deposited on the peeling liquid in the peeling liquid tank 41, the photoresist film PR and the UV resin swell to lower the adhesive force with the iron plate 11. At this time, the adhesion decreases by the sponge roller 52 is accelerated. Then, when it comes out from the peeling liquid, the peeling liquid of 60-90 degreeC is sprayed by the said peeling liquid spray 53 at the pressure of 10-100 kgf / cm <2>, and most of the photosensitive films 12 and 13 and UV resin are peeled off.
    Subsequently, when the iron plate 11 proceeds to the first washing tank 42, it is immersed in the cleaning liquid for a predetermined time, and after the adhesion is lowered by the sponge roller 54, the pure water loaded with the ultrasonic waves is sprayed from the aqua knife 55. The fine residue present in the hole of the iron plate 11 is peeled off.
    Thereafter, the second washing tank 43 is sprayed to incline the high pressure water through the first washing spray 56 to remove residues and foreign substances present in the peeled state from the surface of the iron plate 11.
    Thereafter, when the iron plate 11 proceeds to the third water washing tank 45 through the rustproof liquid tank 44, the rustproof liquid tank 44 and the rustproof liquid tank 44 are sprayed with an air knife 58 using the air knife 58. The foreign substances that may be generated in the third washing tank 45 are simultaneously removed with water.
    As described above, the method of removing the photosensitive film of the shadow mask manufacturing equipment of the present invention includes a sponge roller and a spray solution spray in the stripping solution tank to improve the stripping efficiency, and the ultrasonic wave is loaded in the washing tank using an aqua knife. Since the fine residue can be peeled off by spraying pure water, the yield and quality of the product can be improved.
    In addition, by spraying the air using the air knife (air knife) to the cleaning is completed, there is an effect that can remove the foreign substances that can be generated in the liquid bath and the washing tank at the same time with water.
    权利要求:
    Claims (4)
    [1" claim-type="Currently amended] A first step of dipping the iron plate in the stripping solution to swell the photosensitive film to lower adhesion to the iron plate;
    A second process of spraying pure water loaded with ultrasonic waves on the iron plate on which the first process is performed to peel off the residue present on the iron plate;
    A third process of removing the photoresist film from the surface of the iron plate by spraying water of high pressure on the iron plate on which the second process is performed;
    A fourth step of depositing the anti-rust solution on the surface by immersing the iron plate in the anti-rust solution so that the iron plate on which the third process is performed is not rusted in a subsequent process; And
    And a fifth process of removing a foreign substance on the surface of the iron plate by spraying a cleaning solution on the iron plate on which the fourth process is performed.
    [2" claim-type="Currently amended] The method of claim 1,
    The first process and the second process includes the step of lowering the adhesive force of the photosensitive film and the iron plate by pressing by using a sponge roller in the upper and lower sides of the iron plate, the first process by spraying the peeling liquid at a high pressure to reduce the adhesive force And removing the photoresist film, wherein the second process includes spraying pure water carrying ultrasonic waves toward the iron plate to peel the photoresist film having reduced adhesion.
    [3" claim-type="Currently amended] The method of claim 2,
    The peeling liquid used in the first process maintains a temperature of 60 to 90 ℃, the pressure of the peeling liquid and the pure water sprayed in the first and second process shadow mask, characterized in that to maintain 10 to 100kgf / ㎠ Method of removing photoresist of manufacturing equipment.
    [4" claim-type="Currently amended] The method of claim 1,
    The fifth process includes removing the foreign matter on the surface of the iron plate by spraying the cleaning solution on the iron plate, and then spraying air to remove foreign substances and moisture present on the surface of the iron plate.
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    同族专利:
    公开号 | 公开日
    KR100287731B1|2001-04-16|
    引用文献:
    公开号 | 申请日 | 公开日 | 申请人 | 专利标题
    法律状态:
    1999-03-10|Application filed by 구자홍, 엘지전자 주식회사
    1999-03-10|Priority to KR1019990007940A
    2000-10-16|Publication of KR20000059974A
    2001-04-16|Application granted
    2001-04-16|Publication of KR100287731B1
    优先权:
    申请号 | 申请日 | 专利标题
    KR1019990007940A|KR100287731B1|1999-03-10|1999-03-10|photoresist removal method for shadow mask manufacturing system|
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